Wafer Visual Inspection System

by Tokyo Electron Device

Bring innovation
to your semiconductor production line

Wafer Visual Inspection System Transforming Your Semiconductor Production Line

Are You Facing These Challenges?

Common Challenges
in the Field

  • Want to automate visual inspection
    in high-volume production lines
  • Need to automate microscope-based
    sample inspection
  • Want to replace aging inspection
    equipment

Are
You
Facing
These
Challenges?

Common Challenges
in Inspection

  • Want to perform 100% inspection
    with high throughput
  • Need to inspect front side, back side
    and edge of
    the wafer in a single
    process for better efficiency
  • Want to automatically classify defect types and
    use the data
    to drive process improvement

Quality and
 Efficiency

Tokyo Electron Device
offers the solution.

Our cutting-edge inspection
technology
effectively
addresses all of these issues.

Wafer Visual Inspection System

Wafer Visual
Inspection System

  • High-speed detection of submicron-level defects*40~120/wph

  • Multi-surface inspection (front, back, and
    edge) with a single system

  • Advanced image processing and AI for
    defect detection and automatic
    classification

Three Key Technologies
for Solving Inspection Issues

Technology

High-Speed, High-Sensitivity Macro Inspection

High-Speed, High-Sensitivity
Macro Inspection

Our specially developed optical system detects even subtle changes in light to identify defects.
It enables high-speed, high-sensitivity detection of particles, scratches, film irregularities,
and slip defects on wafers made of silicon, compound semiconductors, glass, and more.

High-Performance Inspection Application

High-Performance Inspection Application

This integrated application manages inspection settings, recipe creation, and equipment control.
It detects target defects using optimized algorithms and automatic defect classification makes it easier to investigate and analyze the cause of defect.

Multi-Function Architecture(Front, Back, and Edge Inspection)

Multi-Function Architecture
(Front, Back, and Edge Inspection)

By integrating front surface, back surface, and edge inspection into a single system, this solution reduces the risk of particle contamination, shorten the total inspection time and save space.
Optional features such as wafer ID reading (OCR) and thickness measurement are also supported.

Applicable Wafers for
Inspection

Wafer

Our system supports a wide range of materials, including silicon wafers, compound wafers, glass wafers, and mask blanks.
We perform defect inspection using optical
systems and image processing tailored to the specific characteristics and defects of each
material.

  • Si(8/12inch)

    Si(8/12inch)

    Main Applications of Wafers

    Widely used in various semiconductors such as logic and memory devices, as well as interposers.

  • SiC(6/8inch)

    SiC(6/8inch)

    Main Applications of Wafers

    For power semiconductor devices
    (e.g., MOSFETs, Schottky Barrier Diodes (SBD), etc.)

  • Glass(8/12inch)

    Glass(8/12inch)

    Main Applications of Wafers

    Support and carrier
    wafers,
    and interposer substrates

  • LT/LN(6/8inch)

    LT/LN(6/8inch)

    Main Applications of Wafers

    SAW devices, optical isolators,
    and sensors

  • GaN(6/8inch)

    GaN(6/8inch)

    Main Applications of Wafers

    Power semiconductors for high voltage and high current, lasers, and LEDs

  • InP(3/4inch)

    InP(3/4inch)

    Main Applications of Wafers

    Optical communication devices such as laser diodes, and high-
    frequency devices

  • Mask Blanks(6inch)

    Mask Blanks(6inch)

Defects Subject to
Inspection

Defect

We inspect various types of defects shown in the diagram on the wafer’s front surface, in-plane,
back surface, and edge.
The primary target defect sizes range from submicron to several tens of microns.

List of Target Defects

Category Types of Defects
to be Detected
Front surface /
Back surface
Foreign particles (Particles)
Contamination (Dirt)
Scratches
Dents (Dimples)
Chips (Chipping)
Cracks
Crystal defects
Pinholes
Protrusions (Protuberances)
Color non-uniformity
Lithography defects
(Litho defects)
Polish marks
Grinding marks
Thermal marks
Haze
Edge notch Cracks / Chips /
Contamination
Bonding surface Voids

Examples of Silicon and
Compound Semiconductor Wafers

Examples of Silicon and Compound Semiconductor Wafers

Examples of Glass Wafers

Examples of Glass Wafers

Example of a Wafer Inspection Process

Inspection Process

ウェーハの検査工程例

Inspection System Lineup

Line Up

We offer dedicated inspection systems tailored to specific inspection targets.
Each system is optimized—including inspection modules, optics, and image processing—to meet
your application needs and deliver a high-quality inspection environment.

Start with a Trial!

Sample Evaluation Available

If you are facing inspection challenges, we offer sample evaluation using our in-house
test environment.
You can assess the feasibility of
inspection before moving forward with equipment implementation.

東京エレクトロンデバイスの会社外観 サンプル評価を実施している様子
Request
a Sample Evaluation
東京エレクトロンデバイスの会社外観 サンプル評価を実施している様子

Download Materials for Free

  • 01

    Visual Inspection of Semiconductor Wafers

    Visual Inspection of Semiconductor Wafers

    What You'll Learn from This
    Guide:

    • ・Various types of wafer materials
    • ・Wafer manufacturing processes and visual inspection
    • ・Types of defects
    • ・Categories of
      inspection
      technologies
  • 02

    The Next Dimension of Semiconductors:
    Exploring Advanced Packaging

    The Next Dimension of Semiconductors: Exploring Advanced Packaging

    What You'll Learn from This Guide:

    • ・Future trends in the market and technology
    • ・Evolution of advanced packaging
    • ・Solutions to wafer processing challenges
Download All Materials (Free)